Photoresist soft bake lamp

Wed, 01 Jul 2026 12:53:57 +0800

On the litho floor, soft bake temperature drift doesn’t show up as a glaring failure. It shows up as line-width variation, solvent hanging around in the resist, and scrap that shows up hours after the fact. What you need is a lamp that holds the photoresist thermal budget right where the recipe calls for it—cycle after cycle. What matters, technically We run near-infrared (NIR) emitters with a spectral output shaped to cut through the resist quickly and evenly, so you don’t get a temperature split between the surface and the bottom of the film. Wafer-level uniformity hits ±0.1°C across the bake zone, which translates straight into repeatable viscosity and consistent coating behavior. The system stays up continuously with zero particle generation—cleanroom-compatible from Class 1 to Class 100. Output stays stable over 5,000+ hours, with intensity drift under 5%, and the thermal profile repeats from lot to lot. Here is why that matters in production: fewer reworks and less exposure to contamination. Tighter thermal control cuts down on solvent trapping and edge bead issues, so CD control stays tighter and you don’t have to trim as much. Energy use drops because NIR heats the resist directly, not the chamber walls. Reliability is built for 24/7 running, with thermal ramps that match the process recipe without overshoot—keeping the lithography sequence moving, without unplanned stops. A couple of practical notes. NIR intensity falls off with distance, so the lamp-to-wafer gap has to be fixed and calibrated at install. Expect a short warm-up to hit setpoint stability, and plan maintenance around emitter life so your schedule doesn’t drift. Make sure the tool is compatible with your coater/track interface, and verify the bake recipe against the lamp’s response time so the process window stays in spec.

Soft on Infrared Glass Heating Technology

Photoresist soft bake lamp